skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Wafer-scale solution-derived molecular gate dielectrics for low-voltage graphene electronics

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4866387· OSTI ID:22293111
; ; ; ;  [1];  [2];  [3]
  1. Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208 (United States)
  2. Department of Chemistry, Northwestern University, Evanston, Illinois 60208 (United States)
  3. Department of Electrical Engineering and Computer Science, Northwestern University, Evanston, Illinois 60208 (United States)

Graphene field-effect transistors are integrated with solution-processed multilayer hybrid organic-inorganic self-assembled nanodielectrics (SANDs). The resulting devices exhibit low-operating voltage (2 V), negligible hysteresis, current saturation with intrinsic gain >1.0 in vacuum (pressure < 2 × 10{sup −5} Torr), and overall improved performance compared to control devices on conventional SiO{sub 2} gate dielectrics. Statistical analysis of the field-effect mobility and residual carrier concentration demonstrate high spatial uniformity of the dielectric interfacial properties and graphene transistor characteristics over full 3 in. wafers. This work thus establishes SANDs as an effective platform for large-area, high-performance graphene electronics.

OSTI ID:
22293111
Journal Information:
Applied Physics Letters, Vol. 104, Issue 8; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English

Similar Records

Charge Conduction and Breakdown Mechanisms in Self-Assembled Nanodielectrics
Journal Article · Thu Jan 01 00:00:00 EST 2009 · Journal of the American Chemical Society · OSTI ID:22293111

Low-voltage and hysteresis-free organic thin-film transistors employing solution-processed hybrid bilayer gate dielectrics
Journal Article · Mon Jul 28 00:00:00 EDT 2014 · Applied Physics Letters · OSTI ID:22293111

Electrical behavior of atomic layer deposited high quality SiO{sub 2} gate dielectric
Journal Article · Thu Jan 01 00:00:00 EST 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:22293111