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Title: Pulsed laser deposition of high-quality thin films of the insulating ferromagnet EuS

High-quality thin films of the ferromagnetic insulator europium(II) sulfide (EuS) were fabricated by pulsed laser deposition on Al{sub 2}O{sub 3} (0001) and Si (100) substrates. A single orientation was obtained with the [100] planes parallel to the substrates, with atomic-scale smoothness indicates a near-ideal surface topography. The films exhibit uniform ferromagnetism below 15.9‚ÄČK, with a substantial component of the magnetization perpendicular to the plane of the films. Optimization of the growth condition also yielded truly insulating films with immeasurably large resistance. This combination of magnetic and electric properties opens the gate for future devices that require a true ferromagnetic insulator.
Authors:
 [1] ;  [2] ;  [2] ; ;  [3] ; ;  [4] ;  [2] ;  [1] ;  [2] ;  [5] ;  [1] ;  [2] ;  [2] ;  [2]
  1. Department of Physics, Stanford University, Stanford, California 94305 (United States)
  2. (United States)
  3. Department of Chemical Engineering and Materials Science, University of California, Davis, California 95616 (United States)
  4. Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305 (United States)
  5. Stanford Nanocharacterization Laboratory, Stanford University, Stanford, California 94305 (United States)
Publication Date:
OSTI Identifier:
22293072
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 8; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM OXIDES; ELECTRICAL PROPERTIES; ENERGY BEAM DEPOSITION; EUROPIUM SULFIDES; FERROMAGNETISM; LASER RADIATION; MAGNETIZATION; OPTIMIZATION; PULSED IRRADIATION; ROUGHNESS; SILICON; THIN FILMS; TOPOGRAPHY