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Title: Surface characterization of silica glass substrates treated by atomic hydrogen

Silica glass substrates with very flat surfaces were exposed to atomic hydrogen at different temperatures and durations. An atomic force microscope was used to measure root-mean-square (RMS) roughness and two-dimensional power spectral density (PSD). In the treatment with atomic hydrogen up to 900 °C, there was no significant change in the surface. By the treatment at 1000 °C, the changes in the RMS roughness and the PSD curves were observed. It was suggested that these changes were caused by etching due to reactions of atomic hydrogen with surface silica. By analysis based on the k-correlation model, it was found that the spatial frequency of the asperities became higher with an increase of the treatment time. Furthermore, the data showed that atomic hydrogen can flatten silica glass surfaces by controlling heat-treatment conditions. - Highlights: • Silica glass surface was treated by atomic hydrogen at various temperatures. • Surface roughness was measured by an atomic force microscope. • Roughness data were analyzed by two-dimensional power spectral density. • Atomic hydrogen can flatten silica glass surfaces.
Authors:
 [1] ;  [1] ;  [2] ;  [3] ; ;  [1] ; ;  [4] ;  [3]
  1. Institute of Industrial Science, The University of Tokyo, Meguro-ku, Tokyo 153-8505 (Japan)
  2. Canon ANELVA Corporation, Asao-ku, Kawasaki, Kanagawa 215-8550 (Japan)
  3. Kawazoe Frontier Technologies Corporation, Kuden 931-113, Sakae-ku, Yokohama, Kanagawa 247-0014 (Japan)
  4. Shin Etsu Quartz Prod. Co., Ltd., Res and Applicat Lab, Fukushima 963-0725 (Japan)
Publication Date:
OSTI Identifier:
22288712
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Characterization; Journal Volume: 86; Other Information: Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; ETCHING; HEAT TREATMENTS; HYDROGEN; ROUGHNESS; SILICA; SPECTRAL DENSITY; SUBSTRATES