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Title: Effect of oxygen partial pressure on microstructural and optical properties of titanium oxide thin films prepared by pulsed laser deposition

Graphical abstract: - Highlights: • Microstructural and optical properties are studied systematically. • The optical properties are studied by UV–visible and photoluminescence. • The PL spectra shows two peaks correspond to bandgap of anatase and rutile. • The maximum refractive index of 2.73 is obtained for rutile phase of titania. - Abstract: Nanocrystalline titanium oxide (TiO{sub 2}) thin films were deposited on silicon (1 0 0) and quartz substrates at various oxygen partial pressures (1 × 10{sup −5} to 3.5 × 10{sup −1} mbar) with a substrate temperature of 973 K by pulsed laser deposition. The microstructural and optical properties were characterized using Grazing incidence X-ray diffraction, atomic force microscopy, UV–visible spectroscopy and photoluminescence. The X-ray diffraction studies indicated the formation of mixed phases (anatase and rutile) at higher oxygen partial pressures (3.5 × 10{sup −2} to 3.5 × 10{sup −1} mbar) and strong rutile phase at lower oxygen partial pressures (1 × 10{sup −5} to 3.5 × 10{sup −3} mbar). The atomic force microscopy studies showed the dense and uniform distribution of nanocrystallites. The root mean square surface roughness of the films increased with increasing oxygen partial pressures. The UV–visible studies showed that the bandgap of the films increasedmore » from 3.20 eV to 3.60 eV with the increase of oxygen partial pressures. The refractive index was found to decrease from 2.73 to 2.06 (at 550 nm) as the oxygen partial pressure increased from 1.5 × 10{sup −4} mbar to 3.5 × 10{sup −1} mbar. The photoluminescence peaks were fitted to Gaussian function and the bandgap was found to be in the range ∼3.28–3.40 eV for anatase and 2.98–3.13 eV for rutile phases with increasing oxygen partial pressure from 1 × 10{sup −5} to 3.5 × 10{sup −1} mbar.« less
Authors:
 [1] ;  [2] ;  [3] ; ;  [4] ;  [5] ;  [1]
  1. Department of Mechanical Engineering, Changwon National University, Changwon 641773 (Korea, Republic of)
  2. (India)
  3. Department of Physics, Changwon National University, Changwon 641773 (Korea, Republic of)
  4. Department of Physics, PERI Institute of Technology, Chennai 600048 (India)
  5. Department of Mechanical Engineering, Bharath University, Chennai 600073 (India)
Publication Date:
OSTI Identifier:
22285223
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Research Bulletin; Journal Volume: 48; Journal Issue: 11; Other Information: Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; ENERGY BEAM DEPOSITION; EV RANGE 01-10; LASER RADIATION; MICROSTRUCTURE; OXYGEN; PARTIAL PRESSURE; PHOTOLUMINESCENCE; PULSED IRRADIATION; QUARTZ; REFRACTIVE INDEX; THIN FILMS; TITANIUM OXIDES; X-RAY DIFFRACTION