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Title: Properties of Ta{sub 2}O{sub 5} thin films prepared by ion-assisted deposition

Graphical abstract: - Highlights: • Investigating the effect of ion-beam parameters on optical properties. • Exploring the effect of ion-beam parameters on structural properties. • Studying XRD patterns of Ta{sub 2}O{sub 5} films deposited at different ion energies. - Abstract: Tantalum penta-oxide (Ta{sub 2}O{sub 5}) thin films were deposited onto highly polished and clean, fused silica glass substrates via ion beam-assisted deposition at room temperature using a high-vacuum coater equipped with an electron beam gun. The effects of ion beam parameters, oxygen flow rate, and deposition rate on the optical and structural properties as well as the stress of Ta{sub 2}O{sub 5} films were studied. It has been revealed that Ta{sub 2}O{sub 5} thin films deposited at 300 eV ion beam energy, 60 μA/cm{sup 2} ion current density, 20 sccm oxygen flow rate and 0.6 nm/s deposition rate demonstrated excellent optical, structural and compressive stress.
Authors:
 [1] ;  [2] ;  [2]
  1. College of Engineering, Wasit University (Iraq)
  2. Center of Advanced Manufacturing and Material Processing, Department of Engineering Design and Manufacture, Faculty of Engineering, University of Malaya, Kuala Lumpur 50603 (Malaysia)
Publication Date:
OSTI Identifier:
22285150
Resource Type:
Journal Article
Resource Relation:
Journal Name: Materials Research Bulletin; Journal Volume: 48; Journal Issue: 10; Other Information: Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CURRENT DENSITY; DEPOSITS; ELECTRON BEAMS; ION BEAMS; OPTICAL PROPERTIES; SILICA; SUBSTRATES; TANTALUM; TANTALUM OXIDES; THIN FILMS