skip to main content

Title: Ordering of self-assembled 5-nm-diameter poly(dimethylsiloxane) nanodots with sub-10 nm pitch using ultra-narrow electron-beam-drawn guide lines and three-dimensional control

We demonstrate the possibility of forming long-range ordered self-assembled arrays of 5-nm-diameter nanodots with pitch of 10 × 7.5 nm{sup 2} using guide line templates and low molecular weight (MW) (4700–1200 g/mol) poly(styrene)-poly(dimethylsiloxane) (PS-PDMS) for application in ultrahigh density patterned magnetic recording media. We propose a three-dimensional control which involves control of the height of the guide lines, the thickness of the PS-PDMS films, and the gap between the guide lines in order to produce 5-nm-diameter, sub-10 nm pitched nanodots with long-range order along the guide lines. Adopting a 13-nm-thick PS-PDMS film and 14-nm-high resist guide lines, the 5-nm-diameter and 10 × 7.5 nm{sup 2}-pitched self-assembled nanodots were ordered in 4–7 dot arrays with long-range order. The experimental results demonstrate that the method is suitable for the production of patterned media with magnetic recording densities of 8.6 Tbit/in.{sup 2} using low MW PS-PDMS and slim guide lines.
Authors:
 [1] ; ;  [2]
  1. Human Resources Cultivation Center, Gunma University, 1-5-1 Tenjin, Kiryu, Gunma 376-8515 (Japan)
  2. Division of Electronics and Informatics, Faculty of Science and Technology, Gunma University, 1-5-1 Tenjin, Kiryu, Gunma 376-8515 (Japan)
Publication Date:
OSTI Identifier:
22283036
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 9; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; CONTROL; ELECTRON BEAMS; MASKING; POLYSTYRENE; QUANTUM DOTS; THICKNESS; THIN FILMS