skip to main content

SciTech ConnectSciTech Connect

Title: Vacuum ultra-violet emission of plasma discharges with high Xe partial pressure using a cathode protective layer with high secondary electron emission

In this work, the mechanism of the vacuum ultra-violet (VUV) emission of plasma discharges, with high Xe partial pressure and high ion-induced secondary electrons emission protective layer, is studied by measuring the VUV light emission directly and comparing it with two-dimensional simulations. From the panel measurement, we find that the high intensity of excimer VUV mainly contributes to the high luminous efficacy of SrCaO-plasma display panels (PDP) at a low sustain voltage. The unchanged Xe excitation efficiency indicates that the electron temperature is not decreased by the high secondary electrons emission protective layer, even though the sustain voltage is much lower. From the two-dimensional simulations, we can find that the ratio of excimer VUV to resonant VUV, which is determined by the collision rate in the discharge, is only significantly affected by the Xe partial pressure, while it is independent of the sustain voltage and the secondary-electrons-emission capability of protective layer. The unchanged average electron energy at the moment when the electric field becomes maximum confirms that the improvement of the VUV production efficiency mainly is attributed to the increase in electron heating efficiency of a PDP with high ion-induced secondary electrons emission protective layer. Combining the experimental and themore » simulation results, we conclude about the mechanism by which the VUV production is improved for the plasma display panel with a high Xe partial pressure and a cold cathode with high ion-induced secondary electrons emission.« less
Authors:
 [1] ;  [2] ;  [3] ;  [4]
  1. School of Electronics and Information Engineering, Tianjin Polytechnic University, Tianjin (China)
  2. State Key Laboratory of Precision Measuring Technology and Instruments, Tianjin University, Tianjin (China)
  3. School of Electronic Science and Engineering, Southeast University, Nanjing (China)
  4. Graduate School of Advanced Science of Matter, Hiroshima University, Higashi-hiroshima, Hiroshima (Japan)
Publication Date:
OSTI Identifier:
22278061
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 6; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CATHODES; COMPARATIVE EVALUATIONS; COMPUTERIZED SIMULATION; ELECTRIC DISCHARGES; ELECTRIC FIELDS; ELECTRON EMISSION; ELECTRON TEMPERATURE; ELECTRONS; FAR ULTRAVIOLET RADIATION; PARTIAL PRESSURE; PLASMA; PLASMA DIAGNOSTICS; PLASMA POTENTIAL; PLASMA PRESSURE; PLASMA SIMULATION