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Title: Enhancement of the magnetic interfacial exchange energy at a specific interface in NiFe/CoO/Co trilayer thin films via ion-beam modification

A series of ferromagnetic Ni{sub 80}Fe{sub 20}(55 nm)/antiferromagnetic CoO (25 to 200 nm)/ferromagnetic Co (55 nm)/SiO{sub 2}(substrate) trilayer thin films were fabricated by ion-beam assisted deposition in order to understand the role of ion beam modification on the interfacial and interlayer coupling. The microstructural study using transmission electron microscopy, X-ray reflectometry, and polarised neutron reflectometry showed that ion-beam modification during the deposition process led to an oxygen-rich Co/CoO nanocomposite interface region at the bottom layer. This interface caused a high exchange bias field for the ferromagnetic cobalt. However, the exchange bias for top permalloy ferromagnet remained low, in line with expectations from the literature for the typical interfacial energy. This suggest that the ion-beam enhancement of the magnetic exchange bias is localized to the Co/CoO interface where local microstructural effects provide the dominant mechanism.
Authors:
 [1] ;  [2] ; ; ;  [3] ;  [4] ;  [5]
  1. The Institute for Superconducting and Electronic Materials, The University of Wollongong, Wollongong, NSW 2522 (Australia)
  2. (Australia)
  3. Department of Materials Science and Engineering, National Chung Hsing University, Taichung 402, Taiwan (China)
  4. Laboratory for Microstructures, Shanghai University, Shanghai 200444 (China)
  5. Australian Nuclear Science and Technology Organisation, Lucas Heights, NSW 2234 (Australia)
Publication Date:
OSTI Identifier:
22278044
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 7; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANTIFERROMAGNETIC MATERIALS; ANTIFERROMAGNETISM; COBALT; COBALT OXIDES; COUPLING; DEPOSITION; INTERFACES; ION BEAMS; ION IMPLANTATION; IRRADIATION; LAYERS; MICROSTRUCTURE; PERMALLOY; PHYSICAL RADIATION EFFECTS; SILICON OXIDES; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION