skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Spectroscopic ellipsometry of homoepitaxial diamond multilayers and delta-doped structures

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4861860· OSTI ID:22275798
; ; ;  [1]
  1. Univ. Grenoble Alpes, Inst. NEEL, F-38042 Grenoble (France)

The optimization of diamond-based unipolar electronic devices such as pseudo-vertical Schottky diodes or delta-doped field effect transistors relies in part on the sequential growth of nominally undoped (p{sup –}) and heavily boron doped (p{sup ++}) layers with well-controlled thicknesses and steep interfaces. Optical ellipsometry offers a swift and contactless method to characterize the thickness, roughness, and electronic properties of semiconducting and metallic diamond layers. We report ellipsometric studies carried out on delta-doped structures and other epitaxial multilayers with various boron concentrations and thicknesses (down to the nanometer range). The results are compared with Secondary Ion Mass Spectroscopy and transport measurements.

OSTI ID:
22275798
Journal Information:
Applied Physics Letters, Vol. 104, Issue 2; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English

Similar Records

Electronic and physico-chemical properties of nanometric boron delta-doped diamond structures
Journal Article · Thu Aug 28 00:00:00 EDT 2014 · Journal of Applied Physics · OSTI ID:22275798

Multiple delta doping of single crystal cubic boron nitride films heteroepitaxially grown on (001)diamonds
Journal Article · Mon Jun 23 00:00:00 EDT 2014 · Applied Physics Letters · OSTI ID:22275798

The effect of surface treatment on the electrical properties of metal contacts to boron-doped homoepitaxial diamond film
Journal Article · Thu Feb 01 00:00:00 EST 1990 · IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (USA) · OSTI ID:22275798