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Title: Effect of capping material on interfacial ferromagnetism in FeRh thin films

The role of the capping material in stabilizing a thin ferromagnetic layer at the interface between a FeRh film and cap in the nominally antiferromagnetic phase at room temperature was studied by x-ray magnetic circular dichroism in photoemission electron microscopy and polarized neutron reflectivity. These techniques were used to determine the presence or absence of interfacial ferromagnetism (FM) in films capped with different oxides and metals. Chemically stable oxide caps do not generate any interfacial FM while the effect of metallic caps depends on the element, showing that interfacial FM is due to metallic interdiffusion and the formation of a ternary alloy with a modified antiferromagnetic to ferromagnetic transition temperature.
Authors:
 [1] ; ; ;  [2] ;  [3] ;  [4] ;  [3] ;  [5] ; ; ;  [6] ; ;  [7] ;  [4] ;  [3]
  1. Department of Materials Science and Engineering, University of California Berkeley, Berkeley, California 94720 (United States)
  2. Department of Physics, University of California, Davis, California 95616 (United States)
  3. (United States)
  4. Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
  5. (France)
  6. Helmholtz Zentrum-Berlin für Materialien und Energie GmbH, Albert-Einstein-Straße 15, D-12489 Berlin (Germany)
  7. NIST Center for Neutron Research, National Institute of Standard and Technology, Gaithersburg, MD 20899 (United States)
Publication Date:
OSTI Identifier:
22275593
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 4; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANTIFERROMAGNETISM; ELECTRON MICROSCOPY; FERROMAGNETISM; INTERFACES; INTERMETALLIC COMPOUNDS; IRON; LAYERS; MAGNETIC CIRCULAR DICHROISM; OXIDES; PHOTOEMISSION; REFLECTIVITY; RHODIUM; TEMPERATURE RANGE 0273-0400 K; TERNARY ALLOY SYSTEMS; THIN FILMS; TRANSITION TEMPERATURE; X RADIATION