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Title: Real time nanoscale structural evaluation of gold structures on Si (100) surface using in-situ transmission electron microscopy

Transport behavior of gold nanostructures on Si(100) substrate during annealing under high vacuum has been investigated using in-situ real time transmission electron microscopy (TEM). A comparative study has been done on the morphological changes due to annealing under different vacuum environments. Au thin films of thickness ∼2.0 nm were deposited on native oxide covered silicon substrate by using thermal evaporation system. In-situ real time TEM measurements at 850 °C showed the isotropic growth of rectangular/square shaped gold-silicon alloy structures. During the growth, it is observed that the alloying occurs in liquid phase followed by transformation into the rectangular shapes. For similar system, ex-situ annealing in low vacuum (10{sup −2} millibars) at 850 °C showed the spherical gold nanostructures with no Au-Si alloy formation. Under low vacuum annealing conditions, the rate of formation of the oxide layer dominates the oxide desorption rate, resulting in the creation of a barrier layer between Au and Si, which restricts the inter diffusion of Au in to Si. This work demonstrates the important role of interfacial oxide layer on the growth of nanoscale Au-Si alloy structures during the initial growth. The time dependent TEM images are presented to offer a direct insight into the fundamental dynamics of themore » sintering process at the nanoscale.« less
Authors:
; ;  [1]
  1. Institute of Physics, Sachivalaya Marg, Bhubaneswar - 751005 (India)
Publication Date:
OSTI Identifier:
22275566
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 18; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 77 NANOSCIENCE AND NANOTECHNOLOGY; ANNEALING; DEPLETION LAYER; DESORPTION; DIFFUSION; EVAPORATION; GOLD; GOLD ALLOYS; MORPHOLOGICAL CHANGES; NANOSTRUCTURES; OXIDES; PRESSURE RANGE MILLI PA; SILICON; SILICON ALLOYS; SINTERING; SUBSTRATES; THIN FILMS; TIME DEPENDENCE; TRANSMISSION ELECTRON MICROSCOPY