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Title: Magnetic and structural properties of MnBi multilayered thin films

Magnetic and structural properties of MnBi films with thicknesses up to 50 nm were investigated. Thin films of the MnBi LTP (Low Temperature Phase) were fabricated onto silica-glass substrates by sputter-deposition of Bi/Mn multilayer, followed by a subsequent annealing at about 550 °C for 30 min. Coercivity of such thin films is higher than 15 kOe, even though the film thickness is about 10 nm. These thin films show the preferential growth of c-axis of the LTP along the film normal. Moreover, high resolution transmission electron microscopy indicates that the LTP regions of 30–50 nm in size are physically isolated by Bi. The magnetization reversal mechanism of such a LTP region is mainly governed by a coherent rotation mode based on the δM curve measurement.
Authors:
 [1] ;  [2] ; ; ; ;  [1] ; ;  [3]
  1. Center for Materials for Information Technology, The University of Alabama, Tuscaloosa, Alabama 35487 (United States)
  2. (Japan)
  3. National Institute for Materials Science, Tsukuba 305-0047 (Japan)
Publication Date:
OSTI Identifier:
22273782
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 17; Conference: 55. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 14-18 Nov 2010; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANNEALING; BISMUTH; COERCIVE FORCE; DEPOSITION; INTERFACES; INTERMETALLIC COMPOUNDS; LAYERS; MAGNETIZATION; MANGANESE; SILICA; SPUTTERING; SUBSTRATES; TEMPERATURE DEPENDENCE; THICKNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY