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Title: Structural and magnetic etch damage in CoFeB

A detailed understanding of the interfacial properties of thin films used in magnetic media is critical for the aggressive component scaling required for continued improvement in storage density. In particular, it is important to understand how common etching and milling processes affect the interfacial magnetism. We have used polarized neutron reflectometry and transmission electron microscopy to characterize the structural and magnetic properties of an ion beam etched interface of a CoFeB film. We found that the etching process results in a sharp magnetic interface buried under a nanometer scale layer of non-magnetic, compositionally distinct material.
Authors:
 [1] ;  [2] ;  [3] ;  [4]
  1. Physics Department, University of California, San Diego, California 92093 (United States)
  2. (United States)
  3. Materials Science and Engineering Division, NIST, Gaithersburg, Maryland 20899 (United States)
  4. Center for Neutron Research, NIST, Gaithersburg, Maryland 20899 (United States)
Publication Date:
OSTI Identifier:
22273710
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 17; Conference: 55. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 14-18 Nov 2010; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; COBALT COMPOUNDS; DAMAGE; ETCHING; INTERFACES; IRON BORIDES; MAGNETIC PROPERTIES; MAGNETISM; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY