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Title: Understanding the deposition mechanism of pulsed laser deposited B-C films using dual-targets

Boron carbide thin films with stoichiometry (boron-carbon atomic ratio) range of 0.1 ∼ 8.9 were fabricated via pulsed laser deposition by using boron-carbon dual-targets. However, this experimental data on stoichiometry were smaller than the computer simulation values. The discrepancy was investigated by studies on composition and microstructure of the thin films and targets by scanning electron microscopy, excitation laser Raman spectroscopy, and X-ray photoelectron spectroscopy. The results indicate that the boron liquid droplets were formed by phase explosion after laser irradiation on boron sector. Part of the boron droplets would be lost via ejection in the direction of laser beam, which is tilted 45° to the surface of substrate.
Authors:
 [1] ;  [2] ; ; ; ;  [1] ;  [3] ;  [4]
  1. State Key Laboratory of Advanced Technology for Material Synthesis and Processing, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070 (China)
  2. (China)
  3. State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070 (China)
  4. School of Optical and Electronic Information, Huazhong University of Science and Technology, 1037 Louyu Road, Wuhan 430074 (China)
Publication Date:
OSTI Identifier:
22273552
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 15; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BORON; BORON CARBIDES; CARBON; COMPUTERIZED SIMULATION; ENERGY BEAM DEPOSITION; EXCITATION; LASER RADIATION; MICROSTRUCTURE; PULSED IRRADIATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY