Understanding the deposition mechanism of pulsed laser deposited B-C films using dual-targets

Journal Article · Mon Apr 21 00:00:00 EDT 2014 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4872141· OSTI ID:22273552

Zhang, Song ^[1]; He, Zhiqiang; Wang, Chuanbin; Shen, Qiang; Zhang, Lianmeng ^[1]; Ji, Xiaoli ^[2]; Lu, Wenzhong ^[3]

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1. State Key Laboratory of Advanced Technology for Material Synthesis and Processing, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070 (China)
2. State Key Laboratory of Silicate Materials for Architectures, Wuhan University of Technology, 122 Luoshi Road, Wuhan 430070 (China)
3. School of Optical and Electronic Information, Huazhong University of Science and Technology, 1037 Louyu Road, Wuhan 430074 (China)

Boron carbide thin films with stoichiometry (boron-carbon atomic ratio) range of 0.1 ∼ 8.9 were fabricated via pulsed laser deposition by using boron-carbon dual-targets. However, this experimental data on stoichiometry were smaller than the computer simulation values. The discrepancy was investigated by studies on composition and microstructure of the thin films and targets by scanning electron microscopy, excitation laser Raman spectroscopy, and X-ray photoelectron spectroscopy. The results indicate that the boron liquid droplets were formed by phase explosion after laser irradiation on boron sector. Part of the boron droplets would be lost via ejection in the direction of laser beam, which is tilted 45° to the surface of substrate.

• OSTI ID: 22273552
• Journal Information: Journal of Applied Physics, Vol. 115, Issue 15; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BORON
BORON CARBIDES
CARBON
COMPUTERIZED SIMULATION
ENERGY BEAM DEPOSITION
EXCITATION
LASER RADIATION
MICROSTRUCTURE
PULSED IRRADIATION
RAMAN SPECTROSCOPY
SCANNING ELECTRON MICROSCOPY
SUBSTRATES
THIN FILMS
X-RAY PHOTOELECTRON SPECTROSCOPY