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Title: Mechanism of force mode dip-pen nanolithography

In this work, the underlying mechanism of the force mode dip-pen nanolithography (FMDPN) is investigated in depth by analyzing force curves, tapping mode deflection signals, and “Z-scan” voltage variations during the FMDPN. The operation parameters including the relative “trigger threshold” and “surface delay” parameters are vital to control the loading force and dwell time for ink deposition during FMDPN. A model is also developed to simulate the interactions between the atomic force microscope tip and soft substrate during FMDPN, and verified by its good performance in fitting our experimental data.
Authors:
 [1] ;  [2] ; ; ;  [3] ; ;  [1] ;  [4]
  1. Key Laboratory for Thin Film and Microfabrication of the Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240 (China)
  2. (China)
  3. State Key Laboratory of Robotics and Systems, Harbin Institute of Technology, Harbin 150080 (China)
  4. Centre for Tetrahertz Research, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, Chongqing 400714 (China)
Publication Date:
OSTI Identifier:
22273443
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 17; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRIC POTENTIAL; INKS; LOADING; MASKING; NANOSTRUCTURES; SUBSTRATES