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Title: Temperature dependencies of hydrogen-induced blistering of thin film multilayers

We report on the influence of sample temperature on the development of hydrogen-induced blisters in Mo/Si thin-film multilayers. In general, the areal number density of blisters decreases with increasing exposure temperature, whereas individual blister size increases with exposure temperatures up to ∼200 °C but decreases thereafter. Comparison as a function of sample temperature is made between exposures to a flux containing both hydrogen ions and neutrals and one containing only neutrals. In the case of the neutral-only flux, blistering is observed for exposure temperatures ≥90 °C. The inclusion of ions promotes blister formation at <90 °C, while retarding their growth at higher temperatures. In general, ion-induced effects become less evident with increasing exposure temperature. At 200 °C, the main effect discernable is reduced blister size as compared with the equivalent neutral-only exposure. The temperature during exposure is a much stronger determinant of the blistering outcome than either pre- or post-annealing of the sample. The trends observed for neutral-only exposures are attributed to competing effects of defect density thermal equilibration and H-atom induced modification of the Si layers. Energetic ions modify the blistering via (temperature dependent) enhancement of H-mobility and re-crystallization of amorphous Si.
Authors:
;  [1] ;  [1] ;  [2]
  1. DIFFER—Dutch Institute for Fundamental Energy Research, Postbus 1207, 3430 BE Nieuwegein (Netherlands)
  2. (Netherlands)
Publication Date:
OSTI Identifier:
22273437
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 17; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; AMORPHOUS STATE; ANNEALING; BLISTERS; CARRIER MOBILITY; COMPARATIVE EVALUATIONS; HYDROGEN; HYDROGEN IONS; INTERFACES; LAYERS; MODIFICATIONS; MOLYBDENUM; RECRYSTALLIZATION; SILICON; TEMPERATURE DEPENDENCE; THIN FILMS