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Title: Highly reproducible and reliable metal/graphene contact by ultraviolet-ozone treatment

Resist residue from the device fabrication process is a significant source of contamination at the metal/graphene contact interface. Ultraviolet Ozone (UVO) treatment is proven here, by X-ray photoelectron spectroscopy and Raman measurement, to be an effective way of cleaning the metal/graphene interface. Electrical measurements of devices that were fabricated by using UVO treatment of the metal/graphene contact region show that stable and reproducible low resistance metal/graphene contacts are obtained and the electrical properties of the graphene channel remain unaffected.
Authors:
 [1] ;  [2] ; ; ; ; ;  [3] ; ; ; ;  [1]
  1. Key Laboratory for the Physics and Chemistry of Nanodevices and Department of Electronics, Peking University, Beijing 100871 (China)
  2. (United States)
  3. Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, MD 20899 (United States)
Publication Date:
OSTI Identifier:
22271227
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 11; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; ELECTRIC CONDUCTIVITY; FABRICATION; GRAPHENE; INTERFACES; METALS; OZONE; RAMAN SPECTROSCOPY; ULTRAVIOLET RADIATION; X-RAY PHOTOELECTRON SPECTROSCOPY