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Title: Pulsed laser deposition of Li–N dual acceptor in p-ZnO:(Li, N) thin film and the p-ZnO:(Li, N)/n-ZnO homojunctions on Si(100)

This article showed the p-type ZnO thin films which were co-doped with different components of Li and N by pulsed laser deposition (PLD) on Si(111) substrates. According to Hall-effect data, the Li-N co-doped ZnO:(Li, N) exhibited stable room-temperature p-type behavior. Combining the XRD, UV-vis transmittance spectrum, and Hall-effect data, the preferable preparation condition was proposed for growing high quality p-type ZnO:(Li, N) film with comparatively low resistivity of 0.09 Ω cm and relatively high carrier concentration of 2.64 × 10{sup 17} cm{sup −3}, which were obtained at 0.1 at. % lithium composition. Furthermore, compared with the photoluminescence spectrum of ZnO:(Li) with ZnO:(Li, N) thin film, the existence of Li–N dual acceptor, which activated the acceptor in ZnO:(Li, N) thin film, was confirmed. On the basis of these, the p-ZnO:(Li, N)/n-ZnO homojunctions on Si(100) substrate was realized by PLD. All these data proved that Li-N dual acceptor would be effective when activated by PLD doping and this approach was feasible to realize the physical device homojunctions on Si substrate.
Authors:
 [1] ;  [2] ; ; ; ;  [1]
  1. Physics School, Anhui University, Jiulong Street 111, Hefei 230601 (China)
  2. (China)
Publication Date:
OSTI Identifier:
22271117
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 115; Journal Issue: 12; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABSORPTION SPECTRA; CONCENTRATION RATIO; CRYSTAL STRUCTURE; DOPED MATERIALS; ENERGY BEAM DEPOSITION; HALL EFFECT; HOMOJUNCTIONS; LASER RADIATION; LITHIUM; NITROGEN; PHOTOLUMINESCENCE; PULSED IRRADIATION; SILICON; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; X-RAY DIFFRACTION; ZINC OXIDES