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Title: Study on higher harmonic suppression using edge filter and polished Si wafer

Higher harmonics contamination is a severe problem in synchrotron beamlines where grating monochromators are used. In these beamlines, absorption edge filters and critical angle mirrors are used to suppress the harmonic contaminations. In the present study, carried out using Indus-1 reflectivity beamline, a harmonic suppression characteristic of Al edge filter and polished silicon wafer are determined. It is found that the Al filter suppresses higher harmonics in 2–7% range whereas the polished silicon wafer can suppress the higher harmonics below 1%. The results of comparative study are discussed.
Authors:
; ; ;  [1]
  1. X-ray Optics Section, ISU Division, Raja Ramanna Centre for Advanced Technology, Indore-452013 (India)
Publication Date:
OSTI Identifier:
22271081
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1591; Journal Issue: 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABSORPTION; ALUMINIUM; FILTERS; HARMONICS; INDUS-1; MIRRORS; MONOCHROMATORS; REFLECTIVITY; SILICON; SPECTRAL REFLECTANCE