skip to main content

Title: Cleaning of optical surfaces by capacitively coupled RF discharge plasma

In this paper, we report cleaning of carbon capped molybdenum (Mo) thin film by in-house developed radio frequency (RF) plasma reactor, at different powers and exposure time. Carbon capped Mo films were exposed to oxygen plasma for different durations at three different power settings, at a constant pressure. After each exposure, the thickness of the carbon layer and the roughness of the film were determined by hard x-ray reflectivity measurements. It was observed that most of the carbon film got removed in first 15 minutes exposure. A high density layer formed on top of the Mo film was also observed and it was noted that this layer cannot be removed by successive exposures at different powers. A significant improvement in interface roughness with a slight improvement in top film roughness was observed. The surface roughness of the exposed and unexposed samples was also confirmed by atomic force microscopy measurements.
Authors:
; ; ;  [1] ; ; ;  [2] ;  [3]
  1. X-ray Optics Section, Indus Synchrotron Utilization Division, Raja Ramanna Centre for Advanced Technology, Indore- 452013 (India)
  2. Laser Plasma Laboratory, Laser Plasma Division Raja Ramanna Centre for Advanced Technology, Indore- 452013 (India)
  3. Mechanical and Optical Support Section, Raja Ramanna Centre for Advanced Technology, Indore- 452013 (India)
Publication Date:
OSTI Identifier:
22271051
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1591; Journal Issue: 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ATOMIC FORCE MICROSCOPY; CARBON; CLEANING; HARD X RADIATION; INTERFACES; LAYERS; MOLYBDENUM; PLASMA; RADIOWAVE RADIATION; REFLECTIVITY; ROUGHNESS; SURFACES; THIN FILMS