Untilting BiFeO{sub 3}: The influence of substrate boundary conditions in ultra-thin BiFeO{sub 3} on SrTiO{sub 3}
- Department of Physics, University of Michigan, Ann Arbor, Michigan 48109 (United States)
- X-ray Science Division, Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
- Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States)
We report on the role of oxygen octahedral tilting in the monoclinic-to-tetragonal phase transition in ultra-thin BiFeO{sub 3} films grown on (001) SrTiO{sub 3} substrates. Reciprocal space maps clearly show the disappearance of the integer-order Bragg peak splitting associated with the monoclinic phase when the film thickness decreases below 20 unit cells. This monoclinic-to-tetragonal transition is accompanied by the evolution of the half-order diffraction peaks, which reflects untilting of the oxygen octahedra around the [110] axis, proving that the octahedral tilting is closely correlated with the transition. This structural change is thickness-dependent, and different from a strain-induced transition in the conventional sense.
- OSTI ID:
- 22269588
- Journal Information:
- APL Materials, Vol. 1, Issue 5; Other Information: (c) 2013 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2166-532X
- Country of Publication:
- United States
- Language:
- English
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