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Title: Intrinsic magnetic properties of hexagonal LuFeO{sub 3} and the effects of nonstoichiometry

We used oxide molecular-beam epitaxy in a composition-spread geometry to deposit hexagonal LuFeO{sub 3} (h-LuFeO{sub 3}) thin films with a monotonic variation in the Lu/Fe cation ratio, creating a mosaic of samples that ranged from iron rich to lutetium rich. We characterized the effects of composition variation with x-ray diffraction, atomic force microscopy, scanning transmission electron microscopy, and superconducting quantum interference device magnetometry. After identifying growth conditions leading to stoichiometric film growth, an additional sample was grown with a rotating sample stage. From this stoichiometric sample, we determined stoichiometric h-LuFeO{sub 3} to have a T{sub N} = 147 K and M{sub s} = 0.018 μ{sub B}/Fe.
Authors:
;  [1] ;  [2] ;  [3] ; ;  [4] ;  [3] ;  [5] ;  [4] ;  [5]
  1. Department of Physics and Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
  2. Department of Physics, Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
  3. School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853 (United States)
  4. Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853 (United States)
  5. (United States)
Publication Date:
OSTI Identifier:
22269568
Resource Type:
Journal Article
Resource Relation:
Journal Name: APL Materials; Journal Volume: 2; Journal Issue: 1; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; DEPOSITS; IRON; LUTETIUM; MAGNETIC PROPERTIES; MOLECULAR BEAM EPITAXY; SQUID DEVICES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION