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Title: Electrochemical deposition of iron sulfide thin films and heterojunction diodes with zinc oxide

Iron sulfide thin films were fabricated by the electrochemical deposition method from an aqueous solution containing FeSO{sub 4} and Na{sub 2}S{sub 2}O{sub 3}. The composition ratio obtained was Fe:S:O = 36:56:8. In the photoelectrochemical measurement, a weak negative photo-current was observed for the iron sulfide films, which indicates that its conduction type is p-type. No peaks were observed in X-ray diffraction pattern, and thus the deposited films were considered to be amorphous. For a heterojunction with ZnO, rectification properties were confirmed in the current-voltage characteristics. Moreover, the current was clearly enhanced under AM1.5 illumination.
Authors:
; ;  [1] ; ;  [2]
  1. DENSO CORP. Research Laboratories, Komenoki, Nissin, Aichi 470-0111 (Japan)
  2. Department of Engineering Physics, Electronics and Mechanics, Nagoya Institute of Technology, Nagoya 466-8555 (Japan)
Publication Date:
OSTI Identifier:
22269544
Resource Type:
Journal Article
Resource Relation:
Journal Name: APL Materials; Journal Volume: 2; Journal Issue: 3; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; AQUEOUS SOLUTIONS; DEPOSITS; ELECTRIC POTENTIAL; ELECTRODEPOSITION; HETEROJUNCTIONS; IRON SULFATES; IRON SULFIDES; SODIUM COMPOUNDS; THIN FILMS; X-RAY DIFFRACTION; ZINC OXIDES