Deposition and characterization of zirconium nitride (ZrN) thin films by reactive magnetron sputtering with linear gas ion source and bias voltage
Journal Article
·
· AIP Conference Proceedings
- Department of Physics, University College of Engineering, Anna University, Dindugal-624622 (India)
- Department of Physics, Thiagarajar College of Engineering, Madurai -625015, Tamilnadu (India)
- Ion Plating, Titan Industries Ltd., Hosur - 635126, Tamilnadu (India)
Zirconium nitride thin films have been prepared on stainless steel substrate (304L grade) by reactive cylindrical magnetron sputtering method with Gas Ion Source (GIS) and bias voltage using optimized coating parameters. The structure and surface morphologies of the ZrN films were characterized using X-ray diffraction, atomic microscopy and scanning electron microscopy. The adhesion property of ZrN thin film has been increased due to the GIS. The coating exhibits better adhesion strength up to 10 N whereas the ZrN thin film with bias voltage exhibits adhesion up to 500 mN.
- OSTI ID:
- 22269395
- Journal Information:
- AIP Conference Proceedings, Vol. 1591, Issue 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Structure and properties of ZrN coatings deposited by high power impulse magnetron sputtering technology
Influence of substrate bias on practical adhesion, toughness, and roughness of reactive dc-sputtered zirconium nitride films
Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputtering
Journal Article
·
Sat Jan 15 00:00:00 EST 2011
· Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
·
OSTI ID:22269395
Influence of substrate bias on practical adhesion, toughness, and roughness of reactive dc-sputtered zirconium nitride films
Journal Article
·
Wed Sep 01 00:00:00 EDT 2004
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
·
OSTI ID:22269395
+1 more
Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputtering
Journal Article
·
Tue Sep 15 00:00:00 EDT 2015
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
·
OSTI ID:22269395
+3 more