Glancing angle deposition of SiO{sub 2} thin film microstructures: Investigations of optical and morphological properties
- Atomic and Molecular Physics Division, Bhabha Atomic Research Centre, Mumbai-400085 (India)
In present work, the optical and the morphological properties of micro-structured SiO{sub 2} thin films fabricated by using glancing angle deposition (GLAD) technique has been carried out. The results are compared with the normally deposited SiO{sub 2} films for the gained advantages. The influence of the glancing angle on the refractive index of porous SiO{sub 2} film was investigated by the spectral transmission measurement in 400–950 nm wavelength regimes. The refractive index has been found to be 1.14@532 nm for the porous SiO{sub 2} film deposited at a glancing angle of 85°. The density and surface qualities of these samples were primarily investigated by using grazing angle X-ray reflectivity (GIXR) and atomic force microscope (AFM) measurements. Results indicate a substantial decrease in film density and refractive index and increase in surface roughness and grain size for GLAD SiO{sub 2} compared to normally deposited SiO{sub 2} films.
- OSTI ID:
- 22269222
- Journal Information:
- AIP Conference Proceedings, Vol. 1591, Issue 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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