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Title: Glancing angle deposition of SiO{sub 2} thin film microstructures: Investigations of optical and morphological properties

In present work, the optical and the morphological properties of micro-structured SiO{sub 2} thin films fabricated by using glancing angle deposition (GLAD) technique has been carried out. The results are compared with the normally deposited SiO{sub 2} films for the gained advantages. The influence of the glancing angle on the refractive index of porous SiO{sub 2} film was investigated by the spectral transmission measurement in 400–950 nm wavelength regimes. The refractive index has been found to be 1.14@532 nm for the porous SiO{sub 2} film deposited at a glancing angle of 85°. The density and surface qualities of these samples were primarily investigated by using grazing angle X-ray reflectivity (GIXR) and atomic force microscope (AFM) measurements. Results indicate a substantial decrease in film density and refractive index and increase in surface roughness and grain size for GLAD SiO{sub 2} compared to normally deposited SiO{sub 2} films.
Authors:
; ; ; ;  [1]
  1. Atomic and Molecular Physics Division, Bhabha Atomic Research Centre, Mumbai-400085 (India)
Publication Date:
OSTI Identifier:
22269222
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1591; Journal Issue: 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; DENSITY; DEPOSITION; DEPOSITS; GRAIN SIZE; REFRACTIVE INDEX; SILICA; SILICON OXIDES; THIN FILMS; X RADIATION