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Title: Effect of substrate temperature on structural and optical properties of nitrogen doped SnO{sub 2} thin film

Nitrogen doped SnO{sub 2}thin films (thickness ∼ 250 nm) were deposited at different substrate temperature by radio frequency (rf) sputtering method. Crystal structure, morphology and optical properties of these films were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and UV-VIS-NIR spectrophotometer, respectively. XRD measurement suggests that the film deposited at room temperature was amorphous in nature and films deposited at higher temperature were crystalline in nature. The film deposited at RT and 200 °C have transparency more than 90% in visible region but the film deposited at 400 °C has lesser transparency. Red shift was observed in the absorption edge may be due to decrease in ionicity due to the formation of the Sn-N bond.
Authors:
 [1] ;  [2] ; ;  [3] ; ;  [4] ;  [5]
  1. U.C.o.E, Punjabi University, Patiala-147002 (India)
  2. Department of Physics, Punjabi University, Patiala-147002 (India)
  3. Pohang Accelerator Lab., San31, Hyojadong, Namgu, Pohang - 790 784 (Korea, Republic of)
  4. Advanced Analysis Center, Korea Institute of Science and Technology, Seoul 136-791 (Korea, Republic of)
  5. Pohang Accelerator Lab., San31, Hyojadong, Namgu, Pohang - 790 784, Republic of Korea and Department of Physics, Pohang University of Science and Technology, Pohang 790-784 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22269217
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1591; Journal Issue: 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ABSORPTION; ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; DEPOSITS; DOPED MATERIALS; NITROGEN; OPACITY; RADIOWAVE RADIATION; RED SHIFT; SPUTTERING; SUBSTRATES; THICKNESS; THIN FILMS; TIN OXIDES; X-RAY DIFFRACTION