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Title: Fabrication of sub-15 nm aluminum wires by controlled etching

We describe a method for the fabrication of uniform aluminum nanowires with diameters below 15 nm. Electron beam lithography is used to define narrow wires, which are then etched using a sodium bicarbonate solution, while their resistance is simultaneously measured in-situ. The etching process can be stopped when the desired resistance is reached, and can be restarted at a later time. The resulting nanowires show a superconducting transition as a function of temperature and magnetic field that is consistent with their smaller diameter. The width of the transition is similar to that of the lithographically defined wires, indicating that the etching process is uniform and that the wires are undamaged. This technique allows for precise control over the normal state resistance and can be used to create a variety of aluminum nanodevices.
Authors:
; ; ;  [1] ;  [1] ;  [2]
  1. Department of Physics and Astronomy, Johns Hopkins University, Baltimore, Maryland 21218 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
22267751
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 17; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ACID CARBONATES; ALUMINIUM; ELECTRON BEAMS; ETCHING; MAGNETIC FIELDS; QUANTUM WIRES; TEMPERATURE DEPENDENCE