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Title: Composition, morphology and mechanical properties of sputtered TiAlN coating

TiAlN coating was deposited on the tungsten carbide cutting tool by using DC magnetron sputtering system to study the influence of substrate bias and nitrogen flow rate on the composition, morphology and mechanical properties. The negatively substrate bias and nitrogen flow rate was varied from about −79 to −221 V and 30 sccm to 72 sccm, respectively. The coating composition and roughness were characterized by using SEM/EDX and Atomic Force Microscopy (AFM), respectively. The dynamic ultra micro hardness tester was used to measure the mechanical properties. The coating hardness increases to about 10-12 GPa with an increase of the negatively substrate bias up to − 200 V and it tend to decrease with an increase in nitrogen flow rate up to 70 sccm. The increase of hardness follows the increase of Ti and N content and rms coating roughness.
Authors:
 [1] ;  [2] ;  [3]
  1. Department of Physics, Faculty of Science and Mathematics, Universitas Negeri Jakarta, Jl. Pemuda No. 10, Jakarta 13220 (Indonesia)
  2. Faculty of Manufacturing Engineering, Universiti Teknikal Malaysia Melaka, Karung Berkunci No. 1752 Pejabat Pos Durian Tunggal 76109 Melaka (Malaysia)
  3. Faculty of Manufacturing Engineering, UniversitiTeknikal Malaysia Melaka, Karung Berkunci No. 1752 Pejabat Pos Durian Tunggal 76109 Melaka (Malaysia)
Publication Date:
OSTI Identifier:
22265965
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1589; Journal Issue: 1; Conference: ICMNS 2012: 4. international conference on mathematics and natural sciences: Science for health, food and sustainable energy, Bandung (Indonesia), 8-9 Nov 2012; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; CUTTING TOOLS; DEPOSITS; FLOW RATE; HARDNESS; MAGNETRONS; NITROGEN; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SUBSTRATES; TUNGSTEN CARBIDES