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Title: Thickness dependent structural, optical and electrical properties of CuIn{sub 0.8}Ga{sub 0.2}Se{sub 2} thin films deposited by pulsed laser deposition

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4861973· OSTI ID:22264019
;  [1]; ; ; ;  [2];  [3]
  1. University Department of Physics, Ranchi University, Ranchi-834008 (India)
  2. Institute Instrumentation Centre, Indian Institute of Technology, Roorkee-247667 (India)
  3. Institute Instrumentation Centre, Indian Institute of Technology, Roorkee-247667, India and Centre for Nanotechnology, Indian Institute of Technology, Roorkee-247667 (India)

CuIn{sub 0.8}Ga{sub 0.2}Se{sub 2} (CIGS) polycrystalline thin films have been deposited on soda lime glass substrate at different deposition time by pulsed laser deposition. The effect of thickness on structural, surface morphological, optical and electrical properties of thin films were investigated by X-ray diffractometer (XRD), field emission scanning electron microscope (FE-SEM), atomic force microscopy (AFM), UV-Vis-NIR spectrophotometer and electrical measurement unit. XRD study reveals that all deposited films are polycrystalline in nature and have tetragonal phase of CIGS. Crystallinity of CIGS films has been found to improve with increase in thickness of CIGS films as evidenced by sharp XRD peaks for (112) orientation. Grain size and rms surface roughness of CIGS films have been found to be increased with increase in thickness. All the deposited CIGS films exhibit direct band gap semiconducting behaviour with ∼10{sup 6} cm{sup −1} absorption co-efficient. Optical band gap and resistivity of CIGS films have been found to decrease with increase in thickness.

OSTI ID:
22264019
Journal Information:
AIP Conference Proceedings, Vol. 1576, Issue 1; Conference: OMTAT 2013: 2. international conference on optoelectronic materials and thin films for advanced technology, Kochi, Kerala (India), 3-5 Jan 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English