Transparent capacitors based on nanolaminate Al{sub 2}O{sub 3}/TiO{sub 2}/Al{sub 2}O{sub 3} with H{sub 2}O and O{sub 3} as oxidizers
- State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, WUT-Harvard Joint Nano Key Laboratory, Wuhan University of Technology, Wuhan 430072 (China)
Transparent capacitors with nanolaminate Al{sub 2}O{sub 3}/TiO{sub 2}/Al{sub 2}O{sub 3} (ATA) hybrid dielectrics have been prepared on quartz glass by atomic layer deposition. The maximal capacitance density of 14 fF/μm{sup 2} at 1 kHz was obtained. Moreover, an ultralow leakage current density of 2.1 × 10{sup −9} A/cm{sup 2} at 1 V was realized by using O{sub 3} as the oxidizer. Fowler-Nordheim tunneling is the main mechanism of the leakage current at high fields, while several conduction mechanisms coexist at low fields. The AlZnO/ATA/AlZnO transparent capacitors exhibit an average optical transmittance of more than 80% in the visible range, which serve as good candidates for integration in transparent circuits.
- OSTI ID:
- 22262561
- Journal Information:
- Applied Physics Letters, Vol. 104, Issue 16; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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