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Title: Strain-induced reduction of surface roughness dominated spin relaxation in MOSFETs

Semiconductor spintronics is a rapidly developing field with large impact on microelectronics. Using spin may help to reduce power consumption and increase computational speed. Silicon is perfectly suited for spin-based applications. It is characterized by a weak spin-orbit interaction which should result in a long spin lifetime. However, recent experiments indicate the lifetime is greatly reduced in gated structures. Thus, understanding the peculiarities of the spin-orbit effects on the subband structure and details of the spin propagation in surface layers and thin silicon films is urgently needed. We investigate the contribution of the spin-orbit interaction to the equivalent valley splitting and calculate the spin relaxation matrix elements by using a perturbative k ⋅p approach. We demonstrate that applying uniaxial stress along the [110] direction may considerably suppress electron spin relaxation in silicon surface layers and thin films.
Authors:
; ; ; ;  [1]
  1. Institute for Microelectronics, TU Wien, Gußhausstraße 27-29, A-1040 Vienna (Austria)
Publication Date:
OSTI Identifier:
22261836
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1566; Journal Issue: 1; Conference: ICPS 2012: 31. international conference on the physics of semiconductors, Zurich (Switzerland), 29 Jul - 3 Aug 2012; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; LAYERS; L-S COUPLING; MATRIX ELEMENTS; MICROELECTRONICS; MOSFET; RELAXATION; SEMICONDUCTOR MATERIALS; SILICON; SPIN; THIN FILMS