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Title: Colored hard coatings with AlN–TiN multilayer structures

AlN–TiN multilayer structures can be used to extend the color gamut of hard coatings while maintaining good hardness and corrosion resistance. This study used reactive magnetron sputtering on a glass substrate to produce coatings with a microhardness of 19 GPa as well as optical reflectance exceeding 80% and controllable saturation (chroma) for various hues of red, yellow, green, blue, and purple. The authors characterized the complex index of refraction of the TiN films using ellipsometry; the real refractive indices of the AlN films were derived from the reflectance values obtained using photometry. Finally, the colors of the samples were quantified using CIE-1931 chromaticity coordinates in the L*a*b* color space, and the microhardness of the films was measured using a nanoindenter. Simulation results using a multiple-beam-interference recursive method presented good consistency with experimental measurements with regard to the optical reflective spectra of AlN–TiN multilayer thin film samples.
Authors:
;  [1]
  1. Department of Materials Engineering and Center for Thin Film Technologies and Applications, Ming Chi University of Technology, 84 Gungjuan Rd., Taishan Dist., New Taipei City 24301, Taiwan (China)
Publication Date:
OSTI Identifier:
22258715
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 32; Journal Issue: 2; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ALUMINIUM NITRIDES; COATINGS; COLOR MODEL; ELLIPSOMETRY; GLASS; INTERFERENCE; LAYERS; MAGNETRONS; MICROHARDNESS; PHOTOMETRY; REFRACTIVE INDEX; SATURATION; SIMULATION; SPECTRA; SPUTTERING; SUBSTRATES; THIN FILMS; TITANIUM NITRIDES