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Title: Controllable nitrogen doping in as deposited TiO{sub 2} film and its effect on post deposition annealing

In order to narrow the band gap of TiO{sub 2}, nitrogen doping by combining thermal atomic layer deposition (TALD) of TiO{sub 2} and plasma enhanced atomic layer deposition (PEALD) of TiN has been implemented. By altering the ratio between TALD TiO{sub 2} and PEALD TiN, the as synthesized TiO{sub x}N{sub y} films showed different band gaps (from 1.91‚ÄČeV to 3.14‚ÄČeV). In situ x-ray diffraction characterization showed that the crystallization behavior of these films changed after nitrogen doping. After annealing in helium, nitrogen doped TiO{sub 2} films crystallized into rutile phase while for the samples annealed in air a preferential growth of the anatase TiO{sub 2} along (001) orientation was observed. Photocatalytic tests of the degradation of stearic acid were done to evaluate the effect of N doping on the photocatalytic activity.
Authors:
; ; ; ; ;  [1] ;  [2] ;  [3] ;  [4] ;  [5]
  1. Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Gent (Belgium)
  2. Department of Bio-Engineering Sciences, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp, Belgium and Center for Surface Chemistry and Catalysis, KU Leuven, Kasteelpark Arenberg 23, B-3001 Heverlee (Belgium)
  3. Department of Bio-Engineering Sciences, University of Antwerp, Groenenborgerlaan 171, B-2020 Antwerp (Belgium)
  4. Center for Surface Chemistry and Catalysis, KU Leuven, Kasteelpark Arenberg 23, B-3001 Heverlee (Belgium)
  5. SCK-CEN, Boeretang 200, B-2400 Mol (Belgium)
Publication Date:
OSTI Identifier:
22258669
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 32; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANNEALING; CRYSTALLIZATION; DEPOSITION; DOPED MATERIALS; FILMS; HELIUM; NITROGEN; OCTADECANOIC ACID; PHOTOCATALYSIS; TITANIUM NITRIDES; TITANIUM OXIDES; X-RAY DIFFRACTION