In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition

Journal Article · Wed Jan 15 00:00:00 EST 2014 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.4851716· OSTI ID:22258560

Devloo-Casier, Kilian; Detavernier, Christophe; Dendooven, Jolien ^[1]; Ludwig, Karl F. ^[2]

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1. Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Ghent (Belgium)
2. Physics Department, Boston University, 590 Commonwealth Avenue, Boston, Massachusetts 02215 (United States)

Atomic layer deposition (ALD) is a thin film deposition technique that has been studied with a variety of in situ techniques. By exploiting the high photon flux and energy tunability of synchrotron based x-rays, a variety of new in situ techniques become available. X-ray reflectivity, grazing incidence small angle x-ray scattering, x-ray diffraction, x-ray fluorescence, x-ray absorption spectroscopy, and x-ray photoelectron spectroscopy are reviewed as possible in situ techniques during ALD. All these techniques are especially sensitive to changes on the (sub-)nanometer scale, allowing a unique insight into different aspects of the ALD growth mechanisms.

• OSTI ID: 22258560
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 32, Issue 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABSORPTION SPECTROSCOPY
DEPOSITION
FLUORESCENCE
PHOTONS
REFLECTIVITY
SMALL ANGLE SCATTERING
SYNCHROTRONS
THIN FILMS
X RADIATION
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY
X-RAY SPECTROSCOPY