Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO{sub 2} using tetrakis(dimethylamido)titanium and water
- Chemical Sciences Division, National Institute of Standards and Technology, 100 Bureau Dr., Stop 8320, Gaithersburg, Maryland 20899-8320 (United States)
- Biomolecular Measurement Division, National Institute of Standards and Technology, 100 Bureau Dr., Stop 8362, Gaithersburg, Maryland 20899-8362 (United States)
- Semiconductor and Dimensional Metrology Division, National Institute of Standards and Technology, 100 Bureau Dr., Stop 8120, Gaithersburg, Maryland 20899-8120 (United States)
Atomic layer deposition of titanium dioxide using tetrakis(dimethylamido)titanium (TDMAT) and water vapor is studied by reflection-absorption infrared spectroscopy (RAIRS) with a time resolution of 120 ms. At 190 °C and 240 °C, a decrease in the absorption from adsorbed TDMAT is observed without any evidence of an adsorbed product. Ex situ measurements indicate that this behavior is not associated with an increase in the impurity concentration or a dramatic change in the growth rate. A desorbing decomposition product is consistent with these observations. RAIRS also indicates that dehydroxylation of the growth surface occurs only among one type of surface hydroxyl groups. Molecular water is observed to remain on the surface and participates in reactions even at a relatively high temperature (110 °C) and with long purge times (30 s)
- OSTI ID:
- 22258556
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 32, Issue 3; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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