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Title: Tailoring the index of refraction of nanocrystalline hafnium oxide thin films

Hafnium oxide (HfO{sub 2}) films were grown by sputter-deposition by varying the growth temperature (T{sub s} = 25–700 °C). HfO{sub 2} films grown at T{sub s} < 200 °C were amorphous, while those grown at T{sub s} ≥ 200 °C were monoclinic, nanocrystalline with (1{sup ¯}11) texturing. X-ray reflectivity (XRR) analyses indicate that the film-density (ρ) increases with increasing T{sub s}. The index of refraction (n) profiles derived from spectroscopic ellipsometry analyses follow the Cauchy dispersion relation. Lorentz-Lorenz analysis (n{sub (λ)} = 550 nm) and optical-model adopted agree well with the XRR data/analyses. A direct T{sub s}-ρ-n relationship suggests that tailoring the optical quality is possible by tuning T{sub s} and the microstructure of HfO{sub 2} films.
Authors:
 [1] ;  [2] ;  [3]
  1. Department of Metallurgical and Materials Engineering, University of Texas at El Paso, El Paso, Texas 79968 (United States)
  2. Materials and Manufacturing Directorate (RX), 3005 Hobson Way, Wright-Patterson Air Force Base (WPAFB), Dayton, Ohio 45433 (United States)
  3. Department of Mechanical Engineering, University of Texas at El Paso, El Paso, Texas 79968 (United States)
Publication Date:
OSTI Identifier:
22257210
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 10; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; CRYSTALS; HAFNIUM OXIDES; MONOCLINIC LATTICES; NANOSTRUCTURES; OPTICAL MODELS; REFRACTIVE INDEX; SPUTTERING; THIN FILMS; X RADIATION