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Title: (In,Ga)As/GaP electrical injection quantum dot laser

Abstract

The paper reports on the realization of multilayer (In,Ga)As/GaP quantum dot (QD) lasers grown by gas source molecular beam epitaxy. The QDs have been embedded in (Al,Ga)P/GaP waveguide structures. Laser operation at 710 nm is obtained for broad area laser devices with a threshold current density of 4.4 kA/cm{sup 2} at a heat-sink temperature of 80 K.

Authors:
;  [1]
  1. Technische Physik, Universität Würzburg, Am Hubland, D-97074 Würzburg (Germany)
Publication Date:
OSTI Identifier:
22257117
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 104; Journal Issue: 1; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; GALLIUM PHOSPHIDES; LASERS; MOLECULAR BEAM EPITAXY; QUANTUM DOTS; THRESHOLD CURRENT; WAVEGUIDES

Citation Formats

Heidemann, M., E-mail: matthias.heidemann@physik.uni-wuerzburg.de, Höfling, S., and Kamp, M. (In,Ga)As/GaP electrical injection quantum dot laser. United States: N. p., 2014. Web. doi:10.1063/1.4860982.
Heidemann, M., E-mail: matthias.heidemann@physik.uni-wuerzburg.de, Höfling, S., & Kamp, M. (In,Ga)As/GaP electrical injection quantum dot laser. United States. https://doi.org/10.1063/1.4860982
Heidemann, M., E-mail: matthias.heidemann@physik.uni-wuerzburg.de, Höfling, S., and Kamp, M. 2014. "(In,Ga)As/GaP electrical injection quantum dot laser". United States. https://doi.org/10.1063/1.4860982.
@article{osti_22257117,
title = {(In,Ga)As/GaP electrical injection quantum dot laser},
author = {Heidemann, M., E-mail: matthias.heidemann@physik.uni-wuerzburg.de and Höfling, S. and Kamp, M.},
abstractNote = {The paper reports on the realization of multilayer (In,Ga)As/GaP quantum dot (QD) lasers grown by gas source molecular beam epitaxy. The QDs have been embedded in (Al,Ga)P/GaP waveguide structures. Laser operation at 710 nm is obtained for broad area laser devices with a threshold current density of 4.4 kA/cm{sup 2} at a heat-sink temperature of 80 K.},
doi = {10.1063/1.4860982},
url = {https://www.osti.gov/biblio/22257117}, journal = {Applied Physics Letters},
issn = {0003-6951},
number = 1,
volume = 104,
place = {United States},
year = {Mon Jan 06 00:00:00 EST 2014},
month = {Mon Jan 06 00:00:00 EST 2014}
}