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Title: Green light emission by InGaN/GaN multiple-quantum-well microdisks

The high-quality In{sub x}Ga{sub 1−x}N/GaN multiple quantum wells were grown on GaN microdisks with γ-LiAlO{sub 2} substrate by using low-temperature two-step technique of plasma-assisted molecular beam epitaxy. We demonstrated that the hexagonal GaN microdisk can be used as a strain-free substrate to grow the advanced In{sub x}Ga{sub 1−x}N/GaN quantum wells for the optoelectronic applications. We showed that the green light of 566-nm wavelength (2.192 eV) emitted from the In{sub x}Ga{sub 1−x}N/GaN quantum wells was tremendously enhanced in an order of amplitude higher than the UV light of 367-nm wavelength (3.383 eV) from GaN.
Authors:
; ; ; ; ; ; ;  [1] ;  [2]
  1. Department of Physics, Department of Materials and Optoelectronic Science, Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan (China)
  2. United Crystal Corporation, No. 243-3, Wenshan 36061, Miaoli, Taiwan (China)
Publication Date:
OSTI Identifier:
22257044
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 104; Journal Issue: 10; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 77 NANOSCIENCE AND NANOTECHNOLOGY; GALLIUM NITRIDES; MOLECULAR BEAM EPITAXY; QUANTUM WELLS; STIMULATED EMISSION; ULTRAVIOLET RADIATION; VISIBLE RADIATION