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Title: High quality single atomic layer deposition of hexagonal boron nitride on single crystalline Rh(111) four-inch wafers

The setup of an apparatus for chemical vapor deposition (CVD) of hexagonal boron nitride (h-BN) and its characterization on four-inch wafers in ultra high vacuum (UHV) environment is reported. It provides well-controlled preparation conditions, such as oxygen and argon plasma assisted cleaning and high temperature annealing. In situ characterization of a wafer is accomplished with target current spectroscopy. A piezo motor driven x-y stage allows measurements with a step size of 1 nm on the complete wafer. To benchmark the system performance, we investigated the growth of single layer h-BN on epitaxial Rh(111) thin films. A thorough analysis of the wafer was performed after cutting in atmosphere by low energy electron diffraction, scanning tunneling microscopy, and ultraviolet and X-ray photoelectron spectroscopies. The apparatus is located in a clean room environment and delivers high quality single layers of h-BN and thus grants access to large area UHV processed surfaces, which had been hitherto restricted to expensive, small area single crystal substrates. The facility is versatile enough for customization to other UHV-CVD processes, e.g., graphene on four-inch wafers.
Authors:
; ; ; ; ; ; ;  [1] ; ; ;  [2]
  1. Physik-Institut, Universität Zürich, CH-8057 Zürich (Switzerland)
  2. Institut für Physik, Universität Augsburg, D-86135 Augsburg (Germany)
Publication Date:
OSTI Identifier:
22255036
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 3; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANNEALING; ARGON; BORON NITRIDES; CHEMICAL VAPOR DEPOSITION; CUTTING; ELECTRON DIFFRACTION; EPITAXY; GRAPHENE; MONOCRYSTALS; RHODIUM; SCANNING TUNNELING MICROSCOPY; THIN FILMS; ULTRAVIOLET RADIATION; X-RAY PHOTOELECTRON SPECTROSCOPY