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Title: Monitoring plasma treatment of thin films by surface plasmon resonance

We report the surface plasmon resonance (SPR) measurements during plasma treatment of thin films by an indigenously designed setup. From the measurements on Al (6.3 nm)/Ag (38 nm) bi-layer at a pressure of 0.02 mbar, the SPR position was found to be shifted by ∼20° after a plasma treatment of ∼7 h. The formation of oxide layers during plasma oxidation was confirmed by glancing angle x-ray diffraction (GXRD) measurements. Combined analysis of GXRD and SPR data confirmed that while top Al layer enables controlling plasma oxidation of Ag, the setup enables monitoring the same. The setup designed is a first of its kind for in situ SPR studies where creation of low pressure is a prerequisite.
Authors:
 [1] ;  [2] ;  [3]
  1. Department of Physics, National Institute of Technology Raipur, 492010 Raipur (India)
  2. US Department of Energy, National Energy Technology Laboratory, Morgantown, West Virginia 26507 (United States)
  3. Department of Physics, Indian Institute of Technology Madras, 600036 Chennai (India)
Publication Date:
OSTI Identifier:
22255035
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 3; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; DESIGN; OXIDATION; OXIDES; PLASMA; PRESSURE RANGE PA; THIN FILMS; X-RAY DIFFRACTION