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Title: An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources

An inverted cylindrical sputter magnetron device has been developed. The magnetron is acting as a metal vapor supply for an electron cyclotron resonance (ECR) ion source. FEM simulation of magnetic flux density was used to ensure that there is no critical interaction between both magnetic fields of magnetron and ECR ion source. Spatially resolved double Langmuir probe and optical emission spectroscopy measurements show an increase in electron density by one order of magnitude from 1 × 10{sup 10} cm{sup −3} to 1 × 10{sup 11} cm{sup −3}, when the magnetron plasma is exposed to the magnetic mirror field of the ECR ion source. Electron density enhancement is also indicated by magnetron plasma emission photography with a CCD camera. Furthermore, photographs visualize the formation of a localized loss-cone - area, when the magnetron is operated at magnetic mirror field conditions. The inverted cylindrical magnetron supplies a metal atom load rate of R > 1 × 10{sup 18} atoms/s for aluminum, which meets the demand for the production of a milliampere Al{sup +} ion beam.
Authors:
; ;  [1] ;  [2] ; ;  [3]
  1. Fraunhofer Institute for Electron Beam and Plasma Technology, 01277 Dresden (Germany)
  2. Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany)
  3. DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)
Publication Date:
OSTI Identifier:
22254895
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 5; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ALUMINIUM; ALUMINIUM IONS; CAMERAS; CHARGE-COUPLED DEVICES; CYLINDRICAL CONFIGURATION; ECR ION SOURCES; ELECTRON CYCLOTRON-RESONANCE; ELECTRON DENSITY; EMISSION; EMISSION SPECTROSCOPY; FLUX DENSITY; ION BEAMS; LANGMUIR PROBE; MAGNETIC FIELDS; MAGNETIC FLUX; MAGNETIC MIRRORS; MAGNETRONS; PHOTOGRAPHY; PLASMA; VAPORS