skip to main content

Title: Characteristics of plasma grid bias in large-scaled negative ion source

The electron density was measured at various bias voltages to understand how the plasma grid bias affects the electron near the plasma grid in large-scaled negative ion sources. It was found that the response of the electron to the bias voltage changes depending on negative ion production processes. The electron density remarkably decreases with increasing the bias voltage in the pure-volume plasma. On the other hand, the electron density depends on the bias voltage weakly in the Cs-seeded plasma. In addition, it was observed that the response of the co-extracted electron current to the bias voltage has similar trend to that of the electron density.
Authors:
; ; ; ; ; ; ;  [1]
  1. National Institute for Fusion Science, Toki 509-5292 (Japan)
Publication Date:
OSTI Identifier:
22254169
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ANIONS; ELECTRIC POTENTIAL; ELECTRON DENSITY; ELECTRONS; PLASMA