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Title: A variable-temperature nanostencil compatible with a low-temperature scanning tunneling microscope/atomic force microscope

We describe a nanostencil lithography tool capable of operating at variable temperatures down to 30 K. The setup is compatible with a combined low-temperature scanning tunneling microscope/atomic force microscope located within the same ultra-high-vacuum apparatus. The lateral movement capability of the mask allows the patterning of complex structures. To demonstrate operational functionality of the tool and estimate temperature drift and blurring, we fabricated LiF and NaCl nanostructures on Cu(111) at 77 K.
Authors:
; ; ;  [1]
  1. IBM Research-Zurich, 8803 Rüschlikon (Switzerland)
Publication Date:
OSTI Identifier:
22254166
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 2; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; ATOMIC FORCE MICROSCOPY; LITHIUM FLUORIDES; NANOSTRUCTURES; PRESSURE RANGE MICRO PA; RESPIRATORS; SCANNING TUNNELING MICROSCOPY; SODIUM CHLORIDES; TEMPERATURE RANGE 0065-0273 K