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Title: Production of fullerene ions by combining of plasma sputtering with laser ablation

We have produced C{sub 60} ion beams by combining plasma sputtering and laser ablation. A C{sub 60} sample was placed in an electron cyclotron resonance type ion source, negatively biased and sputtered by argon plasma. The beam current of C{sub 60}{sup +} decreased rapidly, but it was transiently recovered by a single laser shot that ablates the thin sample surface on the sputtered area. Temporal variations in beam current are reported in response to laser shots repeated at intervals of a few minutes.
Authors:
; ;  [1]
  1. Takasaki Advanced Radiation Research Institute, Japan Atomic Energy Agency, 1233 Watanuki, Takasaki, Gunma 370-1292 (Japan)
Publication Date:
OSTI Identifier:
22254132
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; ABLATION; ARGON; BEAM CURRENTS; ELECTRON CYCLOTRON-RESONANCE; FULLERENES; ION BEAMS; ION SOURCES; LASERS; PLASMA; SPUTTERING