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Title: Photonic crystal membrane reflectors by magnetic field-guided metal-assisted chemical etching

Metal-assisted chemical etching (MacEtch) is a simple etching method that uses metal as the catalyst for anisotropic etching of semiconductors. However, producing nano-structures using MacEtch from discrete metal patterns, in contrast to interconnected ones, has been challenging because of the difficulties in keeping the discrete metal features in close contact with the semiconductor. We report the use of magnetic field-guided MacEtch (h-MacEtch) to fabricate periodic nanohole arrays in silicon-on-insulator (SOI) wafers for high reflectance photonic crystal membrane reflectors. This study demonstrates that h-MacEtch can be used in place of conventional dry etching to produce ordered nanohole arrays for photonic devices.
Authors:
; ;  [1] ; ; ;  [2]
  1. Micro and Nanotechnology Laboratory, Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801 (United States)
  2. Department of Electrical Engineering, NanoFAB Center, University of Texas at Arlington, Arlington, Texas 76019 (United States)
Publication Date:
OSTI Identifier:
22254008
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 103; Journal Issue: 21; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANISOTROPY; CATALYSTS; CRYSTALS; ETCHING; MAGNETIC FIELDS; MEMBRANES; METALS; NANOSTRUCTURES; SEMICONDUCTOR MATERIALS; SILICON