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Title: Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.
Authors:
; ;  [1] ; ;  [2] ; ;  [1] ;  [3] ;  [4]
  1. FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein (Netherlands)
  2. Institute for Spectroscopy RAS, Fizicheskaya str. 5, Troitsk, Moscow 142190 (Russian Federation)
  3. (Netherlands)
  4. ASML, De Run 6501, 5504 DR Veldhoven (Netherlands)
Publication Date:
OSTI Identifier:
22253944
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 103; Journal Issue: 22; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CARBON DIOXIDE LASERS; EXTREME ULTRAVIOLET RADIATION; INFRARED RADIATION; LANTHANUM NITRIDES; LAYERS; LOCAL AREA NETWORKS; MIRRORS