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Title: The electron-phonon relaxation time in thin superconducting titanium nitride films

We report on the direct measurement of the electron-phonon relaxation time, τ{sub eph}, in disordered TiN films. Measured values of τ{sub eph} are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T{sup −3} temperature dependence. The electronic density of states at the Fermi level N{sub 0} is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.
Authors:
 [1] ;  [2] ; ; ;  [1] ; ; ;  [3] ;  [4] ;  [1] ;  [5] ;  [1] ;  [6]
  1. Physics Department, Moscow State Pedagogical University, Moscow 119991 (Russian Federation)
  2. (State University), Dolgoprudny 141700 (Russian Federation)
  3. School of Physics and Astronomy, Cardiff University, Cardiff CF24 3AA (United Kingdom)
  4. National Research Centre, “Kurchatov Institute,” Moscow 123128 (Russian Federation)
  5. (Netherlands)
  6. (Russian Federation)
Publication Date:
OSTI Identifier:
22253712
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 103; Journal Issue: 25; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ELECTRONS; FERMI LEVEL; FILMS; PHONONS; RELAXATION TIME; TEMPERATURE DEPENDENCE; TEMPERATURE RANGE; TITANIUM; TITANIUM NITRIDES