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Title: Recent development of RIKEN 28 GHz superconducting electron cyclotron resonance ion source

Over the past two years, we have tried to improve the performance of the RIKEN superconducting electron cyclotron resonance ion source using several methods. For the production of U vapor, we chose the sputtering method because it is possible to install a large amount of material inside the plasma chamber and thus achieve long-term operation without a break, although it is assumed that the beam intensity is weaker than in the oven technique. We also used an aluminum chamber instead of a stainless steel one. Using these methods, we successfully produced ∼180 eμA of U{sup 35+} and ∼230 eμA of U{sup 33+} at the injected radio frequency (RF) power of ∼4 kW (28 GHz). Very recently, to further increase the beam intensity of U{sup 35+}, we have started to develop a high temperature oven and have successfully produced a highly charged U ion beam. In this contribution, we report on the beam intensity of highly charged U ions as a function of various parameters (RF power and sputtering voltage) and discuss the effects of these parameters on the beam stability in detail.
Authors:
; ; ; ;  [1]
  1. RIKEN, 2-1 Hirosawa, Wako, Saitama (Japan)
Publication Date:
OSTI Identifier:
22253584
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 43 PARTICLE ACCELERATORS; ALUMINIUM; ECR ION SOURCES; ELECTRIC POTENTIAL; GHZ RANGE 01-100; RADIOWAVE RADIATION; SPUTTERING; STAINLESS STEELS; URANIUM IONS; VAPORS