skip to main content

SciTech ConnectSciTech Connect

Title: Hollow metal target magnetron sputter type radio frequency ion source

A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu{sup +} has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu{sup +} had occupied more than 85% of the total ion current. Further increase in Cu{sup +} ions in the beam is anticipated by increasing the RF power and Ar pressure.
Authors:
; ;  [1] ;  [2]
  1. Graduate School of Science and Engineering, Doshisha University, Kyoto 610–0321 (Japan)
  2. Kansai Institute, Advanced Industrial Science and Technology, Osaka 563–8577 (Japan)
Publication Date:
OSTI Identifier:
22253579
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 85; Journal Issue: 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 74 ATOMIC AND MOLECULAR PHYSICS; COPPER IONS; EXCITATION; ION BEAMS; ION SOURCES; MAGNETRONS; MHZ RANGE 01-100; RADIOWAVE RADIATION; SPUTTERING